Showing posts with label Tin. Show all posts
Showing posts with label Tin. Show all posts

Tin

Chemical state assignment for tin is difficult due to overlapping Sn 3d5/2 values for SnO and SnO2 (see Table 1.). The Auger parameter and Auger spectral shapes may be helpful here (click for post).

Sn 3d5/2 binding energy values [1].
Sn 3d5/2 binding energy values from standards taken in this laboratory [2].
Sn(0): 484.90 eV, 0.59 eV FWHM at 10 eV pass energy, slightly asymmetric peak-shape defined  by LA(1.2,1.5,5).
Air formed oxide on polished Sn metal: 486.77 eV, 1.61 eV FWHM at 10 eV pass energy
ITO (Indium tin oxide): 486.8 eV

Sn 3d spectrum of a freshly polished tin metal surface [2].
Sn 3d5/2-3d1/2 splitting: 8.41 eV [3]
Sn 3p3/2: 715 eV
Sn 3p1/2: 757 eV
Sn 3s: 885 eV
Sn 4d: 25 eV
Sn 4p: 89 eV
Sn 4s: 137 eV

References:
[1] C.D. Wagner, A.V. Naumkin, A. Kraut-Vass, J.W. Allison, C.J. Powell, J.R.Jr. Rumble, NIST Standard Reference Database 20, Version 3.4 (web version) (http:/srdata.nist.gov/xps/) 2003.
[2] M.C. Biesinger, unpublished results (2012).
[3] J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corp, Eden Prairie, MN, 1992.

Tin Auger Parameters

Tin Auger (Sn 3d5/2 - M4N45N45) parameter values [1,2,3,4].
Wagner plot for tin are available from [2,5].
Sn Auger spectra are available from [6].

References:
[1] C.D. Wagner, A.V. Naumkin, A. Kraut-Vass, J.W. Allison, C.J. Powell, J.R.Jr. Rumble, NIST Standard Reference Database 20, Version 3.4 (web version) (http:/srdata.nist.gov/xps/) 2003.
[2] L. Kover, G. Moretti, Zs. Kovacs, R. Sanjines, I. Cserny, G. Margaritondo, J. Palinkas, H. Adachi, J. Vac. Sci. Technol. A. 13 (1995) 1382-1388.
[3] L. Kover, Zs. Kovacs, R. Sanjines, G. Moretti,  I. Cserny, G. Margaritondo, J. Palinkas, H. Adachi, Surf. Interface. Anal. 23 (1995) 461-466.
[4] K. Schenk-Meuser, H. Duschner, Fresenius J. Anal. Chem. 358 (1997) 265-267.
[5] V.M. Jimenez, J.P. Espinos, A.R. Gonzalez-Elipe, Surface Science 366 (1996) 556-563.
[6] S. Suzer, Pure & Appl. Chem. 69 (1997) 163-168.